| 摘要 |
PROBLEM TO BE SOLVED: To provide a metal polishing fluid which can realize a high polishing speed ratio between a foundation barrier layer and an insulating layer, can realize high surface uniformity and high flatness, and can form the flush pattern of a metal film with high reliability, and to provide a polishing method using the fluid. SOLUTION: A metal polishing fluid contains metal oxidizing agent, metal oxide dissolving agent, protective film forming agent, water-soluble polymer and water, and has the ratio of the polishing speed of a metal layer to the polishing speed of a barrier layer not less than 10 and the ratio of the polishing speed of the metal layer to the polishing speed of an insulating layer not less than 100.
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