发明名称 APPARATUS AND METHOD FOR MEASURING DIFFRACTION OF OBLIQUELY EMITTED X-RAYS
摘要 PROBLEM TO BE SOLVED: To measure a diffraction pattern having a desired S/B ratio by reducing the background due to the scattering of air generated by X-rays transmitted through a sample in the case of the measurement of the diffraction of obliquely emitted X-rays. SOLUTION: A shield member 13 is arranged between a sample 3 and an X-ray detector 6 so that the light path of X-rays 11 transmitted through the sample is not looked from the X-ray detector 6 without shielding diffracted X-rays. When the diffraction of obliquely emitted X-rays is measured, a part of primary X-rays emitted from an X-ray source 9 transmits through the sample 3 and the scattering of air and scattered X-rays are generated in the periphery of the sample 3 by X-rays 11 transmitted through the sample 3 but shielded by the shield member 13, and only diffracted X-rays 5 are detected by the X-ray detector 6. Therefore, the background due to the scattering of air and scattered X-rays is reduced and a diffraction pattern having a desired S/B ratio is measured.
申请公布号 JP2001141675(A) 申请公布日期 2001.05.25
申请号 JP19990327275 申请日期 1999.11.17
申请人 CANON INC 发明人 TAKADA KAZUHIRO;NOMA TAKASHI
分类号 G01N23/207;(IPC1-7):G01N23/207 主分类号 G01N23/207
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