STABILIZED OSCILLATOR CIRCUIT FOR PLASMA DENSITY MEASUREMENT
摘要
A method and system for controlling electron densities in a plasma processing system (105). By applying a dither voltage (117) and a correction voltage to a voltage-controller oscillator (101), electron density of an open resonator plasma processing system (105) may be measured and controlled as part of a plasma-based process.
申请公布号
WO0137306(A1)
申请公布日期
2001.05.25
申请号
WO2000US19540
申请日期
2000.07.20
申请人
TOKYO ELECTRON LIMITED;SIRKIS, MURRAY, D.;VERDEYEN, JOSEPH, T.
