| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a gas purification facility, in view of the problems of conventional technologies, which prevents an impure gas from getting mixed into a cover gas system in a Na plant in order to supply a clean inactive gas, by removing ingredients of the impure gas that get mixed into the Na plant, where chemically active Na is handled. SOLUTION: A high-performance gas purification facility where a substance, whose chemical activity is as high as that of Na or is higher than it is a filler is integrated into a cover gas system such as a Na plant, whereby a clean inactive gas can be supplied to the Na plant. Consequently, contamination of the Na plant by Na can be lessened and the load on an Na purification facility (cold trap) for the operation for refining Na can be reduced, by placing the gas purification facility of the present invention in the cover gas system of the Na plant.</p> |
