| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning/drying method and apparatus capable of cleaning/drying a substrate having a resist formed on the surface thereof without dissolving the resist. SOLUTION: A cleaning/drying apparatus 1 for cleaning and drying a substrate W to be processed which has a resist film formed thereon, comprises a cleaning vessel 2 capable of storing an aqueous cleaning solution, a drying chamber 3 arranged above the vessel 2 for drying the substrate W, chemical supplying mechanisms 44, 46, and 47, in the chamber 3, for supplying a hydrophobic chemical which does not substantially dissolve the resist and which has higher volatility than water, and a moving mechanism 5 for moving the substrate W between the vessel 2 and the chamber 3. The mechanisms 44, 46, and 47 supply the vaporous chemical to the chamber 3, and then the substrate W dipped into the aqueous cleaning solution within the vessel 2 is elevated by the mechanism 5 to bring the chemical vapors supplied to the chamber 3 into contact with the surface of the substrate W.
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