| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate holding device which can reduce both the metal contamination of a silicon substrate held thereby and the charge-up of a surface of the silicon substrate. SOLUTION: This substrate holding device covers the surface of a clamper 8 to hold a peripheral edge of the silicon substrate 2 toward a base 6 by a silicon film 10 except a surface 8a at which the clamper 8 is brought into contact with the silicon substrate 2.
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