Method for handling semiconductor wafers in a clean room by wearing dust proof clothing

摘要

Dust proof clothing is made of a given fabric structure defined by multiple first fiber groups which are each composed of linear fibers and extend in a first direction, and multiple second fiber groups which are each composed of curved fibers and extend in a second direction intersecting the first direction. The first and second fiber groups are mutually interwoven such that an inside surface has more of the second fiber groups exposed than the first fiber groups, and such that an outside surface which is opposite said inside surface has more of the first fiber groups exposed than said second fiber groups. The dust proof clothing is worn such that the inside surface is in contact with a wearer of the dust proof clothing.