发明名称 GRINDING APPARATUS, GRINDING METHOD AND CLEANING METHOD OF GRINDING TOOL
摘要 PROBLEM TO BE SOLVED: To provide a grinding apparatus, a grinding method and a cleaning method of a grinding tool in which grinding agents or impurities adhered to the grinding tool of the grinding apparatus and solidified can be reliably removed, generation of scratches on a work can be suppressed, and residual particles left on the surface to be ground of the work can be reduced. SOLUTION: In the cleaning method of the grinding tool to clean the rotatably held grinding tool 8, a cleaning member 32 provided with surfaces 34 and 33 facing each other to form a gap between surfaces 8a and 8b to be cleaned of the grinding tool 8 with respect to the grinding tool 8 is disposed, a cleaning solution is fed to gaps δ1 and δ2 formed between the surfaces 33 and 34 facing each other and the surfaces 8a and 8b to be cleaned to form a cleaning solution film, the grinding tool is rotated to clean the surfaces to be cleaned, and the cleaning solution to the gaps between the surfaces 8a and 8b and the surfaces 33 and 34 is fed through a feed hole 36 formed in the cleaning member 32 and opened in the surfaces 33 and 34.
申请公布号 JP2001138233(A) 申请公布日期 2001.05.22
申请号 JP19990330007 申请日期 1999.11.19
申请人 SONY CORP 发明人 AKAIKE YOSHIFUMI
分类号 B24B53/00;B24B53/007;B24B53/013;B24B53/017;H01L21/304 主分类号 B24B53/00
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