发明名称 SPUTTERING TARGET HAVING PROLONGED LIFE
摘要 PROBLEM TO BE SOLVED: To develop a sputtering target having a prolonged life for depositing a thin film on an integrated circuit. SOLUTION: A planar target having rings which are annular step regions of the thickness increased prositionally corresponding to target raceway regions in which erosion grooves are caused in the process of sputtering is provided. These rings increased in thickness provide additional materials for sputtering without giving minus influence on the properties of a thin film. This target can be sputtered over a prolonged period before the exchange is made needed, and thereby, increases the productivity of thin film formation by deposition. These rings have a planar upper face and both side faces tilted thereto. The rings have a thickness of 2 to 6 mm and a width of 20 to 60 mm.
申请公布号 JP2001140063(A) 申请公布日期 2001.05.22
申请号 JP20000288293 申请日期 2000.09.22
申请人 PRAXAIR ST TECHNOL INC 发明人 STRAUSS DAVID;BLANCHET JEAN PIERRE
分类号 C23C14/34;H01J37/34;H01L21/203;H01L21/285;(IPC1-7):C23C14/34 主分类号 C23C14/34
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