发明名称 Low dielectric constant films with high glass transition temperatures made by electron beam curing
摘要 Production of a dielectric coating on a substrate whereby a poly(arylene ethers) or fluorinated poly(arylene ethers) layer is cured by exposure to electron beam radiation. A wide area electron beam is used which causes chemical reactions to occur in the polymer structure which are thought to cause crosslinks between polymer chains. The crosslinks lead to higher mechanical strength and higher glass transition temperature, lower thermal expansion coefficient, greater thermal-chemical stability and greater resistance to aggressive organic solvents. The polymer layer may also be optionally heated, thermally annealed, and/or exposed to UV actinic light.
申请公布号 US6235353(B1) 申请公布日期 2001.05.22
申请号 US19990245060 申请日期 1999.02.05
申请人 ALLIEDSIGNAL INC. 发明人 DRAGE JAMES S.;YANG JINGJUN;CHOI DONG KYU
分类号 C08G85/00;B05D3/02;B05D3/06;H01L21/312;(IPC1-7):C08F2/48;C08J7/18 主分类号 C08G85/00
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