| 摘要 |
A mask pattern data creation method which automatically reflects changes made to layout cell data upon correcting the layout cell data hierarchically lower than mask pattern data, and eliminates the need for a user to manually perform deletion processing or layout processing in order to prevent human errors that may be introduced into layout data on the layout cell data to be laid out in the mask pattern data. The method places the layout cell data hierarchically below dummy cell data based on the layout data of entered layout cell data and then places the dummy cell data hierarchically below the mask pattern data, adds the layout data on the layout cell data to the dummy cell data, and creates graphic data corresponding to an angle specified in the layout data by expanding the layout cell data below the dummy cell data. When correcting the layout cell data, the system reads the layout data added to the dummy cell data and deletes the graphic data from the dummy cell data.
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