发明名称 |
Method and device for producing silicon-rich foundry iron |
摘要 |
Disclosed is a process and apparatus for generating high-silicon foundry pig iron. In the process:a) silicon oxides and iron-carbon metals are charged in a shaft furnace;b) the charge is kept under a highly reducing atmosphere;c) the material column is guided annularly at least in the vicinity of the vessel bottom andd) exposed to the radiation heat of a heat source located in the free space in the outlet region of the annular material column above the furnace base.The furnace has a centrally arranged electrode, which projects into the furnace vessel and is guided up to the vicinity of the base, and a counterelectrode arranged in the base of the furnace vessel. The electrode projecting into the vessel is enclosed by a coaxially guided sleeve whose outer diameter "d" is in a ratio to the inner diameter "D" of the furnace vessel such that d;D is about 1:4. The sleeve mouth is at a distance "a" from the base of the furnace vessel such that 2xd<=a<=4xd.
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申请公布号 |
US6235075(B1) |
申请公布日期 |
2001.05.22 |
申请号 |
US19980011416 |
申请日期 |
1998.03.06 |
申请人 |
MANNESMANN AKTIENGESELLSCHAFT |
发明人 |
HOFMANN WERNER;REICHELT WOLFGANG |
分类号 |
C21B13/02;C21C1/08;C22B9/187;(IPC1-7):C21B11/10 |
主分类号 |
C21B13/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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