| 摘要 |
PROBLEM TO BE SOLVED: To provide an ESCAP type polymer as a resist material for a chemical amplification type excimer laser, capable of selectively and partly separating and decomposing a protective group of a phenolic hydroxy group by an acid, having a controlled structure containing no carboxylic acid residue, a narrow dispersiveness and an excellent resolving capacity. SOLUTION: This alkenylphenol copolymer having a ratio (Mw/Mn) of weight average mol.wt. (Mw) to number average mol.wt. (Mn)of 1.00-1.05 and no carboxylic acid residue is synthesized first by obtaining a block copolymer comprising an alkenylphenol having a protected phenolic hydroxy, or the alkenyphenol and a vinyl aromatic compound, and a (meth) acrylic ester, by an anion polymerization, then a specific amount of a protective group of the phenolic hydroxy group is separated or decomposed using an acidic agent. |
