发明名称 ELECTRON BEAM CORRECTION METHOD AND STRUCTURE OF ELECTRON GUN FOR INLINE TYPE PICTURE TUBE
摘要 PROBLEM TO BE SOLVED: To solve the problem where a quadrupole lens for reducing astigmatism due to deflecting magnetic field for self-convergence produces hale to lower resolution with respect to R and B beam spots at both ends of three electron beams in the electron beam correcting method and manufacture of electron gun structure of an inline-type picture tube. SOLUTION: A quadrupole lens has at least the first focusing electrode, to which first focusing voltage Ec3s with a fixed value and the second focusing electrode, to which second focusing voltage Ec3d that varies synchronously with deflecting the electron beam, and produces a force, between the first and second focusing electrodes, to focus the electron beam in either horizontal or vertical direction depending on which voltage is higher, the first focusing voltage Ec3s or the second focusing voltage Ec3d. This invention is featured with an electron beam correction method of the quadrupole lens in the horizontal and vertical directions equal in intensity for the central beam and side beams in the horizontal lens, while making different in the vertical lens, and an electron gun that is obtained by this method.
申请公布号 JP2001135257(A) 申请公布日期 2001.05.18
申请号 JP19990309360 申请日期 1999.10.29
申请人 NEC KANSAI LTD 发明人 NAKANISHI AKIRA
分类号 H01J29/48;H04N3/26;(IPC1-7):H01J29/48 主分类号 H01J29/48
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