发明名称 THIN FILM TRANSISTOR, MANUFACTURING METHOD THEREOF AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To suppress a change in the threshold voltage Vt of a thin film transistor. SOLUTION: A gate insulating film 4 contains SiO2 as its main component and the quantity of carbon in the insulating film 4 is set at 2×1019 cm-3 or more, whereby a thin film transistor, which has the high concentration film 4 and is little changed its threshold voltage Vt, is provided.</p>
申请公布号 JP2001135822(A) 申请公布日期 2001.05.18
申请号 JP19990313398 申请日期 1999.11.04
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MASHITA SHUNJI;SAKAI MASAHIRO;SANO HIROSHI;TSUTSU HIROSHI
分类号 G09F9/30;G02F1/136;G02F1/1365;G02F1/1368;H01L21/336;H01L29/786;(IPC1-7):H01L29/786 主分类号 G09F9/30
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