发明名称 |
THIN FILM TRANSISTOR, MANUFACTURING METHOD THEREOF AND LIQUID CRYSTAL DISPLAY DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To suppress a change in the threshold voltage Vt of a thin film transistor. SOLUTION: A gate insulating film 4 contains SiO2 as its main component and the quantity of carbon in the insulating film 4 is set at 2×1019 cm-3 or more, whereby a thin film transistor, which has the high concentration film 4 and is little changed its threshold voltage Vt, is provided.</p> |
申请公布号 |
JP2001135822(A) |
申请公布日期 |
2001.05.18 |
申请号 |
JP19990313398 |
申请日期 |
1999.11.04 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
MASHITA SHUNJI;SAKAI MASAHIRO;SANO HIROSHI;TSUTSU HIROSHI |
分类号 |
G09F9/30;G02F1/136;G02F1/1365;G02F1/1368;H01L21/336;H01L29/786;(IPC1-7):H01L29/786 |
主分类号 |
G09F9/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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