发明名称 DEVELOPING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a developing device which stabilizes the quality of a processing liquid by curtailing the number of pats disposed in supply paths and reflux paths for the processing liquid and stably supplies the processing liquid. SOLUTION: A coating vessel 32 of a coating tank 26 is communicated with bellows 46 and the water feed path 44 in a coating device 22 of the developing device. The bottom end of the bellows 46 is supported by an eccentric cam 48 and the eccentric cam 48 is rotated by driving of a motor 50, by which the bottom end of the bellows 46 is vertically moved. As a result, the volume of the bellows 46 increases or decreases and the water W is supplied to the coating vessel 32 or is refluxed from the coating vessel 32. As a result, the there is no more need for disposing parts, such as a pump and valve, on the water feed path 44. Then, the degradation in the quality of the water W exchanged by the dirt sticking to the part does not occur and the good water quality may be maintained. The malfunction by the adhesion of the dirt to the valves, etc., does not occur either. Accordingly, the stable supply of the processing liquid (water W) is made possible.
申请公布号 JP2001133952(A) 申请公布日期 2001.05.18
申请号 JP19990318826 申请日期 1999.11.09
申请人 FUJI PHOTO FILM CO LTD 发明人 ONO TAKEHISA
分类号 G03D13/00;(IPC1-7):G03D13/00 主分类号 G03D13/00
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