发明名称 EXPOSURE DEVICE FOR PHOTOGRAPHIC PROCESSING MACHINE
摘要 PROBLEM TO BE SOLVED: To save a development processing liquid, to reduce the cost required for the development processing liquid and to reduce the operator's burden when carrying out work to assort merchandise prints. SOLUTION: This device is provided with a transporting mechanism 13 for transporting photosensitive materials 5 from a magazine 6, an exposure mechanism 12 for exposing the photosensitive materials 5 at the prescribed point in its transporting route and a cutter 7 for successively cutting the photosensitive materials 5 on the upstream side or downstream side of the exposure mechanism 12. The device is provided with a recovering mechanism 14 for recovering the cut waste photosensitive materials 5 cut by the cutter 7 freely changeably over to a recovering state and a non-recovering stage.
申请公布号 JP2001133889(A) 申请公布日期 2001.05.18
申请号 JP19990312916 申请日期 1999.11.02
申请人 NORITSU KOKI CO LTD 发明人 AKIRA TOSHIROU
分类号 G03D15/04;G03B27/32;G03B27/46;(IPC1-7):G03B27/32 主分类号 G03D15/04
代理机构 代理人
主权项
地址