| 摘要 |
PROBLEM TO BE SOLVED: To provide an EB direct writing device and an optimizing method of a beam size for improving accuracy in compensation of a beam size in vari able molding and matching the size at both partial batch and variable molding. SOLUTION: In an optimizing method of a beam size, a beam scan waveform at a reference pattern on a batch aperture is considered as a reference beam size. Several pattern sizes are formed in variable molding for a beam scan waveform as the reference beam size waveform to generate beam scan waveforms with different sizes. At the same time a correlation with the reference beam size waveform is calculated.
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