发明名称 SUPPLYING METHOD AND SUPPLYING DEVICE FOR FLUX
摘要 PROBLEM TO BE SOLVED: To provide a flux supply device as well as flux supply method where flux is supplied at high positional accuracy and high-accuracy transfer amount. SOLUTION: For a flux supply device for supplying a flux 3 to an electrode pad of a substrate, a flux supply pallet 1, where a flux supply hole 2 is formed at a position corresponding to the electrode pad of substrate, and a flux transfer plate 5 where a projection 6 is formed corresponding to the flux supply hole 2, are provided.
申请公布号 JP2001135925(A) 申请公布日期 2001.05.18
申请号 JP19990313646 申请日期 1999.11.04
申请人 NEC CORP;JAPAN EM KK 发明人 TAKAHASHI NOBUAKI;SENBA NAOHARU;SHIMADA YUZO;YAMAMOTO TAKUMI;FUTAGAMI KAZUHIKO;HATASE AKIRA
分类号 H05K3/34;(IPC1-7):H05K3/34 主分类号 H05K3/34
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