METHOD AND DEVICE FOR PROCESSING SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To reduce residual contaminants on the surface of a substrate by effectively drying the substrate for removal of water thereon with the air of small amount and slow speed. SOLUTION: A substrate processing device has a transfer roller 6 of the substrate 3 substantially in the horizontal direction, an air knife nozzle 3 for flowing mixed gas containing water soluble organic solvent at the concentration range of 0.05% to 90% under the substrate vapor pressure on the surface of the substrate 3 after washing transferred substantially in the horizontal direction.