| 摘要 |
PROBLEM TO BE SOLVED: To enhance resolution characteristics, e.g. limit resolving power or depth of focus, in an exposure technology employing deformation illumination method as means for attaining good resolution characteristics for a fine pattern and using apertures of various shapes for deformation illumination. SOLUTION: In an aperture 10 for use in an aligner, translucent regions 11, 12, 13, 14 defined by four arcs are arranged symmetrically to X and Y axes passing through the center of the aperture 10.
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