| 摘要 |
PROBLEM TO BE SOLVED: To prevent or reduce thermal deformation of an original plate effectively and to prevent thermal deformation of an original plate without having any adverse effect on the measurement accuracy of position of the original plate. SOLUTION: The scanning projection aligner for exposing the pattern of an original plate R onto a substrate W while moving the original plate and the substrate relative to a projection optical system 8 comprises means 12 for supplying air toward the upper surface of the original plate during movement wherein the air supply means has an air supply opening elongated in the direction substantially orthogonal to the scanning direction or a plurality of air supply openings arranged in that direction. The air supply means also has first and second air supply openings located on the opposite sides of a specified illumination region on the original plate in the scanning direction. The air supply openings of the air supply means are arranged to supply air from an interferometer 16 for measuring the position of an original plate stage RST toward the optical axis IX side of the projection optical system when viewed from the scanning direction. Furthermore, an exhaust means is provided between the air supply openings of the air supply means and the interferometer.
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