发明名称 Plasma reactor with coil antenna of plural helical conductors with equally spaced ends
摘要 The invention is embodied in a coil antenna for radiating RF power supplied by an RF source into a vacuum chamber, the coil antenna including plural helical conductors each having a first end and a second end, the first ends being adapted for connection to a first common RF potential, the second ends being adapted for connection to a second common RF potential, each of the plural conductors being wound about a common axis of helical symmetry, each of the second ends being spaced substantially equally from the axis and from each other.
申请公布号 US2001001201(A1) 申请公布日期 2001.05.17
申请号 US20000742051 申请日期 2000.12.20
申请人 APPLIED MATERIALS, INC. 发明人 QIAN XUE-YU;SATO ARTHUR H.
分类号 H01J37/32;H05H1/46;(IPC1-7):B23K10/00 主分类号 H01J37/32
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