发明名称 |
METHOD OF NITRIDING IRON GROUP ALLOY BASE MATERIAL |
摘要 |
A method of nitriding a iron group alloy base material, which can sufficiently remove a passive film, provide a positive and uniform nitriding, and shorten an overall nitriding time. A method of nitriding a iron group alloy base material (material to be treated) including alloy elements forming nitrides by a plasma-nitriding including a passive film removing process, the passive film removing being carried out by hydrogen sputtering under a reduced pressure, the hydrogen sputtering preferably being started at room temperature during heating process of a material to be treated for plasma sputtering.
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申请公布号 |
WO0134867(A1) |
申请公布日期 |
2001.05.17 |
申请号 |
WO2000JP07831 |
申请日期 |
2000.11.08 |
申请人 |
CEMM CO., LTD.;KANBE, SHIGEAKI;HUKUTA, HIRONORI;KATOU, KOUSUKE |
发明人 |
KANBE, SHIGEAKI;HUKUTA, HIRONORI;KATOU, KOUSUKE |
分类号 |
C23C8/02;C23C8/38;(IPC1-7):C23C8/38 |
主分类号 |
C23C8/02 |
代理机构 |
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代理人 |
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主权项 |
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