发明名称 SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PURPOSE: A semiconductor manufacturing apparatus is provided to improve uniformity and the efficiency of the maintenance works and to easily adjust the position between a tube and a boat cover. CONSTITUTION: A vertical furnace for use in a semiconductor manufacturing apparatus comprises a heater(4), an outer tube(1), an inner tube(3), a boat(19) adapted to be introduced into the inner tube with a wafer loaded thereon, and a boat cover(20) disposed internally of the inner tube concentrically therewith. The boat cover(20) is comprised of a boat cover body and an auxiliary cover plate connected to the boat cover body with a given gap therebetween. The boat cover body has a predetermined number of slit apertures extending in a generator direction thereof. The auxiliary cover plate is disposed to cover the slit apertures.
申请公布号 KR100296998(B1) 申请公布日期 2001.05.16
申请号 KR20010001148 申请日期 2001.01.09
申请人 HITACHI KOKUSAI ELECTRIC INC. 发明人 MAEDA KIYOHIKO;KAKIZAKI SATOSHI;TANIYAMA TOMOSHI;YANAGAWA HIDEHIRO;SUZAKI KEN-ICHI
分类号 H01L21/22;C23C16/44;C23C16/455;C30B25/14;C30B31/16;H01L21/00;(IPC1-7):H01L21/22 主分类号 H01L21/22
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