发明名称 |
SEMICONDUCTOR MANUFACTURING APPARATUS |
摘要 |
PURPOSE: A semiconductor manufacturing apparatus is provided to improve uniformity and the efficiency of the maintenance works and to easily adjust the position between a tube and a boat cover. CONSTITUTION: A vertical furnace for use in a semiconductor manufacturing apparatus comprises a heater(4), an outer tube(1), an inner tube(3), a boat(19) adapted to be introduced into the inner tube with a wafer loaded thereon, and a boat cover(20) disposed internally of the inner tube concentrically therewith. The boat cover(20) is comprised of a boat cover body and an auxiliary cover plate connected to the boat cover body with a given gap therebetween. The boat cover body has a predetermined number of slit apertures extending in a generator direction thereof. The auxiliary cover plate is disposed to cover the slit apertures.
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申请公布号 |
KR100296998(B1) |
申请公布日期 |
2001.05.16 |
申请号 |
KR20010001148 |
申请日期 |
2001.01.09 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC. |
发明人 |
MAEDA KIYOHIKO;KAKIZAKI SATOSHI;TANIYAMA TOMOSHI;YANAGAWA HIDEHIRO;SUZAKI KEN-ICHI |
分类号 |
H01L21/22;C23C16/44;C23C16/455;C30B25/14;C30B31/16;H01L21/00;(IPC1-7):H01L21/22 |
主分类号 |
H01L21/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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