Photosensitive material processing device

摘要

In a shutter facing an aperture portion in a partition plate in a photosensitive material processing device, a blocking member, formed substantially in a semicircular cylindrical shape, is placed by the rotation of a shaft between blades thereby closing the aperture portion. The opening between the blades is opened by rotating the blocking member integrally with the shaft so that a photosensitive material can pass through. Multileveled surfaces are formed on the top surface of a guide plate. Aperture portions for mounting rollers with adaptors are formed in an alternating pattern on the surfaces. A plurality of protruding guide ribs are provided extending across the surfaces. A plurality of brush roller parameters are adjusted so that a winding mark index defined by the parameters falls within a predetermined range. Rollers are washed when a finisher control system is restarted after an unforeseen long stoppage. Water is supplied by pumps consistent with the amount of water pumped out for predetermined uses. When the total value of the amount of water supplied reaches a predetermined value, a predetermined amount of chemical agents are added to the water supply tank by another pump. At this time, the chemical agents are homogeneously mixed in the water in the tank by a water supply tank mixing section, thereby controlling the concentration of the chemical agent. A stopper is provided for softening the shock when a processed photosensitive material drops down a steep slope of a stacking device for stacking the processed photosensitive material. <IMAGE>