发明名称 Field effect transistor structure and method of manufacture
摘要 A field effect transistor structure is formed with a body semiconductor layer (1) having source (3), channel (7), drift region (9) and drain (5). An upper metallisation layer (15,17) is separated from the body by an oxide layer (11). The upper metallisation layer (15,17) has a gate region (15) arranged over the body and a field plate region (17) arranged over the drift region (9). A source contact (39) is connected to both the source (9) and the field plate region (25).
申请公布号 GB0107405(D0) 申请公布日期 2001.05.16
申请号 GB20010007405 申请日期 2001.03.23
申请人 KONINKLIJKE PHILIPS ELECTRONICS N.V. 发明人
分类号 H01L29/786;H01L21/266;H01L21/336;H01L29/06;H01L29/08;H01L29/40;H01L29/417;H01L29/78 主分类号 H01L29/786
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