| 摘要 |
PURPOSE: A method and an apparatus for processing a plasma are provided to reduce the charge-up damage in the plasma processing method. CONSTITUTION: In a parallel flat plate plasma processing apparatus, before ignition of a plasma, such a bias at a frequency at which the plasma is not ignited is applied to an electrode which holds a substrate to be processed. At the time of plasma quenching, the plasma is quenched in the condition of the bias applied to the electrode.
|
