| 摘要 |
PURPOSE: An agent for reducing the board-dependence of a resist composition, its reducing method and a resist composition are provided, to allow a rectangular pattern to be formed even onto a strong alkali organic refraction-prevention film to improve the dimension controllability and the solution stability. CONSTITUTION: The agent for reducing the board-dependence comprises a compound represented by the formula(1), wherein R41 is H or a methyl group; R42 is H, a methyl group, an ethyl group or a phenyl group; R43 is a straight, branched or cyclic alkyl group of C1-C6; and n is 0 or 1. Preferably the compound of the formula(1) is added to a resist composition by 0.5-30 wt%. The resist composition comprises the compound of the formula(1); a polymer which is soluble in an alkali developing aqueous solution; and an acid generator. Preferably the polymer is a compound represented by the formula(2) or 3.
|
