| 摘要 |
PURPOSE: A lithograph projecting equipment is provided to prevent focus error and overlay error which are caused by existing contamination particles between a retaining surface and a back of a substrate. CONSTITUTION: The lithograph projecting equipment consists of irradiating devices (LA, EX, IN and CO) for supplying an irradiation projection beam (PB), a first material table (MT) for holding a mask (MA), a second material table (WT) having a surface for retaining and holding a substrate (W), and a projector (PL) for forming an image of an irradiated part of the mask (MA) on a target of the substrate (W). A contamination detecting means is constituted and arranged to detect existence of contamination on either one or both of a retaining surface and the back of the substrate.
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