METHOD FOR MANUFACTURING LATENT IMAGE, METHOD FOR DETECTING LATENT IMAGE, EXPOSURE METHOD, EXPOSURE APPARATUS, RESIST AND SUBSTRATE

摘要

PURPOSE: A method for manufacturing a latent image is provided to form a fine mark suitable for high precision alignment as the latent image, even by irradiating light of a short wavelength used in an exposure process. CONSTITUTION: Exposure light is irradiated to a reticle having a pattern. The light transmitting the reticle or reflected from the reticle is irradiated to a substrate(1) on which resist is applied, through a projection optical system, so that the pattern of the image is formed on the substrate by a predetermined material included in the resist. The predetermined material changes its color based upon the irradiation of the exposure light.