| 摘要 |
PURPOSE: A photoresist composition and a method for producing a positive photoresist relief image are provided, which is useful as a component of chemically amplified positive-acting resists. CONSTITUTION: A photoresist composition comprises a photoactive component; and a resin binder which contains a polymer. The polymer contains a photoacid-labile ester group containing a tertiary ester alicyclic group having at least about 125Å3 molecular volume and present in an amount of about 1-50 mol% based on all the polymer units; and repeating units of a phenol group present in an amount of about 20-95 mol% based on all the polymer units. The alicyclic contains a single ring, or at least two fused or bridged rings. Preferably the polymer comprises further at least one unit selected from the group consisting of an acid-labile group containing leaving groups except the alicyclic moiety, an acid, nitriles, phenyl group, lactones and anhydrides.
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