发明名称 |
CLEANING AGENT FOR SEMICONDUCTOR DEVICE AND PRODUCTION OF SEMICONDUCTOR DEVICE |
摘要 |
PURPOSE: To provide a cleaning agent improved so that it may not cause disconnection of wirings or buried conductive layers. CONSTITUTION: This agent contains a hydroxide, water, and at least either of the compounds represented by formulae I and II: HO-((EO)x-(PO)y)z-H (I) and R-£((EO)x-(PO)y)z-H|m (II). In the formulae, EO is an oxyalkylene group; PO is an oxypropylene group; and x and y are integers satisfying x/(x+y)=0.05-0.4; and z is a positive integer; R is a residue derived by removing at least one hydroxyl group or aminic hydrogen atom from an alcohol or an amine; and m is an integer of 1 or greater. Desirably, the hydroxide is selected from tetramethylammonium hydroxide, potassium hydroxide, and sodium hydroxide.
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申请公布号 |
KR20010040000(A) |
申请公布日期 |
2001.05.15 |
申请号 |
KR20000058401 |
申请日期 |
2000.10.05 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA;SUMITOMO CHEMICAL CO., LTD. |
发明人 |
GANO ITARU;ICHIKI NAOKI;MORITA HIROSHI;NEZU HIDEAKI;TAKASHIMA MASAYUKI;YOKOI NAOKI |
分类号 |
H01L21/302;C09K13/02;C11D1/44;C11D1/722;C11D3/02;C11D3/04;C11D11/00;H01L21/02;H01L21/304;H01L21/306;H01L21/3065;H01L21/311;H01L21/3213;(IPC1-7):H01L21/304 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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