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发明名称
METHODS FOR REDUCING MASK EROSION DURING PLASMA ETCHING
摘要
申请公布号
KR20010040638(A)
申请公布日期
2001.05.15
申请号
KR1020007008510
申请日期
2000.08.04
申请人
发明人
分类号
H01J37/32
主分类号
H01J37/32
代理机构
代理人
主权项
地址
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