发明名称 METHOD AND SYSTEM FOR DISPATCHING LOT WHICH VARIABLY ADOPTS OPTIMUM SUBSEQUENT PROCESSING EQUIPMENT AND/OR SUBSEQUENT PROCESS CONDITION ACCORDING TO RESULT OF PRIOR PROCESS
摘要 <p>PURPOSE: A method for dispatching a lot which variably adopts optimum subsequent processing equipment and/or subsequent process condition according to a result of a prior process is provided to dispatch respective lots processed in a preceding process with a subsequent process equipment optimum for improving the quality of the lot based upon a process result of the preceding process regarding the lots, capability of a plurality of subsequent process equipment and/or a systematic analysis result of relativity between characteristics. CONSTITUTION: Measured data of an inspection item regarding the respective second lots processed by the first process equipment before the first lot is accumulated in a computer system(100c). And, measured data of an inspection item regarding the respective second lots processed by one of a plurality of the second process equipment is consecutively accumulated in the computer system. The first process equipment generates a variation with reference to a target value of the inspection item regarding the first lot based upon the accumulated measurement data. The second process equipment compensates for the variation toward the target value of the inspection item. Process capability of the respective second process equipment is estimated. A dispatching priority regarding the plurality of second process equipment of the first lot is determined according to the process capability. The first lot is dispatched by one of the plurality of the second process equipment based upon the dispatching priority.</p>
申请公布号 KR20010038300(A) 申请公布日期 2001.05.15
申请号 KR19990046227 申请日期 1999.10.23
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHAE, HUI SEON;CHO, DAE SIK;DONG, SEUNG HUN;KANG, HUI SE;KIM, SEOK HYEON;KWAK, DO SUN;OH, JAE SEOK;PARK, IL SEOK;YOON, TAE YANG
分类号 H01L21/66;G05B19/418;H01L21/02;(IPC1-7):H01L21/00 主分类号 H01L21/66
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