发明名称 MICRO-SWITCH AND FABRICATING METHOD THEREOF
摘要 PURPOSE: A micro-switch and a fabricating method thereof are to employ an insulating film having a high permittivity to increase an impedance on/off ratio and an on-capacitance, and drive the switch with lower voltage, and also increase yield. CONSTITUTION: A lower electrode(2) formed on a substrate to use as a signal transmitting line. An insulating film (3) consisting of a ferroelectric material is formed on the lower electrode. A ground portion(6) is formed at both sides of the substrate to be apart from each other at a desired distance. A hinge(5) is formed on the insulating film having an air gap to be moved up and down. An upper electrode(4) is formed in a desired thickness on the hinge corresponding to the insulating film. The ferroelectric material is one of STO(strontium titanate oxide) and BSTO(barium STO). The ground portion has a thickness corresponding to a height of the air gap. The lower electrode has a thickness corresponding to the height of the air gap at both side of the insulating film.
申请公布号 KR20010038214(A) 申请公布日期 2001.05.15
申请号 KR19990046102 申请日期 1999.10.22
申请人 LG ELECTRONICS INC. 发明人 PARK, JAE YEONG
分类号 H01L29/86;(IPC1-7):H01L29/86 主分类号 H01L29/86
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