| 摘要 |
PURPOSE: An apparatus for eliminating particles of a reticle is provided to completely eliminate every particle on the reticle in a one-shot process, by making a scanner detect a precise position of a particle on the reticle, and by making a vacuum line move to the position detected by the scanner to remove the particle from the corresponding position. CONSTITUTION: A reticle is settled on a stage(1). A scanner(2) scans the surface of the reticle and detects a position of a particle, capable of horizontally moving on the stage. The position of the particle detected by the scanner is inputted to driving units(3,4) for vertical and horizontal axes which is disposed in directions of vertical and horizontal axes of the stage. Vertical and horizontal axis arms(5,6) are respectively connected to the driving units for the vertical and horizontal axes. A vacuum line(7) precisely moves to the position detected by the scanner, and absorbs and eliminates the particle, installed in a crossing part of the vertical axis arm and the horizontal axis arm.
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