发明名称 TUNGSTEN FILAMENT FOR VAPOR DEPOSITION AND ITS DEPOSITION METHOD
摘要 PROBLEM TO BE SOLVED: To provide a filament for vapor deposition which is small in deformation or corrosion and less easily generates defects in a work to be vapor- deposited, and its deposition method. SOLUTION: The tungsten filament 1 for vapor deposition comprises at least one tungsten wire containing no dopant and at least one dope tungsten which are twisted with each other.
申请公布号 JP2001131734(A) 申请公布日期 2001.05.15
申请号 JP19990321119 申请日期 1999.11.11
申请人 ALLIED MATERIAL CORP 发明人 SAKAKIBARA KAZUNAGA
分类号 C23C14/26;C22C27/04;(IPC1-7):C23C14/26 主分类号 C23C14/26
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