METHOD FOR FORMING SWELLING PATTERN AND BASE BODY HAVING THE SAME PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a method for forming an entirely new projecting and recessed pattern without necessitating an etching process or an embossing process using a form. SOLUTION: The selectivity in a deposition part of a water repellent material is improved by controlling the difference of the contact angles of the pattern composed of a water repellent part and a hydrophilic part to water to >=80 deg.. A base layer having fine uneven structure and an uppermost layer having water repellency are provided on the water repellent part to control the difference of the contact angle from that of the hydrophilic part to >=80 deg.. An intermediate layer having a light degrading activity is provided between the base layer and the uppermost layer to improve the resolution of a water repellent/hydrophilic pattern, and selective decomposition is performed to impart hydrophilicity to the surface layer having the water repellency by light irradiation through a photomask. The selectivity of the deposition is improved by using a liquid containing colloidal silica and water as a hydrophilic liquid to form large swelling shape. A further greater swelling pattern is formed by using a liquid in which particularly a thermoplastic resin particles are dispersed.