发明名称 Method of forming liquid film
摘要 A liquid output portion is arranged above a substrate. In the substrate, a film formation region and a non-film-formation region are determined. The liquid output portion is responsible for continuously outputting a liquid in a constant amount to the substrate. The substrate and the liquid output portion are relatively moved by a moving portion. Below the liquid output portion, a liquid shut-out portion is arranged. At least one of the substrate and the liquid output portion is moved and ready to supply of the liquid from the liquid output portion to the non-film-formation region, the supply is shut out by the liquid shut-out portion. A liquid, which has been controlled so as to spread in a constant amount, is continuously output from the liquid output nozzle to the substrate. While the nozzle and the substrate are relatively moved, the liquid is supplied to a first region on the substrate. While the nozzle and the substrate are relatively moved, the liquid is supplied to a second region on the substrate in such a way that the liquid supplied from the nozzle and spread in a second region on the substrate is in contact with the liquid which has supplied and spread in the first region on the substrate. In the case where projections and depressions are formed on the surface of the substrate, an amount of the liquid to be supplied to the substrate is varied depending upon the ratio between the projections and depressions.
申请公布号 US6231917(B1) 申请公布日期 2001.05.15
申请号 US19990335508 申请日期 1999.06.18
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 ITO SHINICHI;OKUMURA KATSUYA
分类号 B05B12/12;B05B13/04;B05C5/02;B05C11/10;G03C1/498;G03F7/16;(IPC1-7):B05D3/14 主分类号 B05B12/12
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