APPARATUS AND METHOD FOR PROCESSING EXHAUST GAS OF PROCESS FOR MANUFACTURING SEMICONDUCTOR

摘要

PURPOSE: A method for processing exhaust gas of a process for manufacturing a semiconductor is provided to prevent particles and reaction byproducts from stopping up an inlet of a thermal oxidation reactor, by inducing protection gas to the thermal oxidation reactor to separate halogen-containing exhaust gas from vapor. CONSTITUTION: Vapor is supplied to an end of the inlet of an oxidation unit. At least a part of a halogen-containing component of an exhaust fluid is transformed to a type that can be more efficiently processed, while the vapor at the end of the inlet of the oxidation unit is used. At least a part of the component of the exhaust fluid that can be oxidized in the oxidation unit is oxidized.