发明名称 Method of forming interlayer film
摘要 A method of forming an interlayer film on a substrate with a plurality of patterns formed thereon wherein the interlayer film is deposited on the substrate by a process comprising a plurality of steps in each of which a portion of the film is deposited so as to have different fluidity with the same source material.
申请公布号 US6232245(B1) 申请公布日期 2001.05.15
申请号 US19990265232 申请日期 1999.03.08
申请人 SONY CORPORATION 发明人 HARA MASAKI
分类号 H01L21/3105;H01L21/316;H01L21/768;(IPC1-7):H07L21/44 主分类号 H01L21/3105
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