发明名称 |
Plasma processing apparatus |
摘要 |
The plasma processing apparatus includes a substrate table 10 that extends from a wall of the vacuum chamber 1 toward the inside of the vacuum chamber 1. A rotary holder 8, to which the substrate 5 is mounted, is arranged in a concave portion 10a that is provided in the substrate table 10. The rotary holder 8 is rotatably supported with its periphery being sealed with a sealing member 10b. Blades 9 are provided inside the rotary holder 8. A supply port 11 and a drainage port 12, for supplying and draining a fluid such that a rotation force is exerted on the blades 9, are formed in the substrate table 10. Supplying a fluid through the supply port 11 cools the substrate 5 while causing it to rotate.
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申请公布号 |
US6231726(B1) |
申请公布日期 |
2001.05.15 |
申请号 |
US19990471512 |
申请日期 |
1999.12.23 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
SUEMITSU TOSHIYUKI;MORI NOBUYUKI;YOKOYAMA MASAHIDE;YAMAMOTO MASAHIRO |
分类号 |
H05H1/46;C23C14/34;C23C14/50;C23C14/54;H01L21/00;(IPC1-7):C23C14/34 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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