METHOD FOR ELIMINATING CONTAMINATION MATERIAL ADHERED TO SURFACE AND APPARATUS USED THE SAME

摘要

PURPOSE: A method for eliminating a contamination material adhered to a surface is provided to remove the contamination material adhered to the surface of various articles such as a semiconductor substrate or glass substrate for a liquid crystal, by processing the contamination material at a room temperature within a short interval of time. CONSTITUTION: Ozone is melted in an organic solvent which has a partition coefficient higher than 0.6 regarding ozone in gas, to make process liquid. The process liquid becomes in contact with the surface of a process target to which the contamination material is adhered, so that the contamination material is removed.