发明名称 METHOD FOR PRODUCTION OF AQUEOUS RESIN SOLUTION WITH REDUCED RESIDUAL MONOMER CONTENT
摘要 PROBLEM TO BE SOLVED: To provide a method for producing an aqueous resin solution whereby a residual monomer is effectively removed from the solution and hence the resultant aqueous resin solution has a low residual monomer content. SOLUTION: An aqueous resin solution containing a residual monomer is brought into contact with a substance having an ion-exchange function to remove electrolytic impurities from the solution. Then, cyclodextrin is added to the solution, and an inclusion compound of cyclodextrin and the residual monomer in the solution is formed at a pH of 6.0 to 9.0. The inclusion compound is removed by centrifugal separation at a rotation speed of 10,000 rpm. Thus, an aqueous resin solution reduced in the residual monomer content is produced.
申请公布号 JP2001131219(A) 申请公布日期 2001.05.15
申请号 JP19990312519 申请日期 1999.11.02
申请人 TAISEI KAKO KK 发明人 GO KISEKI;SUNAMORI TAKASHI
分类号 C07B63/02;C08F6/06;(IPC1-7):C08F6/06 主分类号 C07B63/02
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