发明名称 |
ELECTRON FLOOD GUN FOR ION IMPLANTATION PROCESS |
摘要 |
PURPOSE: An electron flood gun for an ion implantation process is provided to improve assembly and maintain an excellent insulating state, by firmly fixing a reflector in a housing to prevent the reflector from moving while easily coupling a fixing screw. CONSTITUTION: A housing(10) has a plurality of screw insertion holes(12). A reflector(20) has respective hanging grooves in a portion facing the screw insertion hole of the housing. A fixing screw(50) is coupled to the screw insertion hole of the housing and in the groove of the reflector. The first insulating member(62) is inserted into a hanging protrusion of the screw insertion hole of the housing to support the head part of the fixing screw. The second insulating member(64) is inserted into an interface between the housing and the reflector, having a protrusion simultaneously inserted into the screw insertion hole of the housing and the groove of the reflector to prevent the reflector from moving in the coupling of the fixing screw. A filament(30) emits thermal electrons. A grid part(40) collects the emitted thermal electrons and forms electron cloud.
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申请公布号 |
KR20010039232(A) |
申请公布日期 |
2001.05.15 |
申请号 |
KR19990047536 |
申请日期 |
1999.10.29 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
JU, YEONG BYEONG |
分类号 |
H01L21/265;(IPC1-7):H01L21/265 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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