发明名称 TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To prevent atmospheric components from permeating/penetrating through the wall of a resin piping to avoid contaminating a work due to infiltration of atmospheric components. SOLUTION: This treatment apparatus for treating a work W housed in a treating container 1 in a prescribed gas atmosphere uses a resin piping 11a as a gas feed piping 11 and has an orifice 21 provided downstream of the resin piping 11a, so as to feed gas at a pressure higher than the atmospheric pressure in the resin piping 11a.
申请公布号 JP2001126998(A) 申请公布日期 2001.05.11
申请号 JP19990306349 申请日期 1999.10.28
申请人 TOKYO ELECTRON LTD 发明人 HONMA MANABU;SHIMAZU TOMOHISA
分类号 H01L21/22;C23C16/455;H01L21/205;(IPC1-7):H01L21/22 主分类号 H01L21/22
代理机构 代理人
主权项
地址