| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a manufacturing method, etc., for a transfer mask, having very high accuracy of the corner squareness of an opening pattern and a very high joining accuracy. SOLUTION: In this manufacturing method for a transfer mask, having openings formed into a thin film supported with a support frame, the openings are formed, using an etching mask layer as a mask, the etching mask layer is formed, using a resist pattern formed by the lithography using a photoresist as the mask, and the corner squareness of the opening pattern is set at 90 deg.±0.3 deg..</p> |
