METHOD FOR PRODUCING HARD MASK FOR EXPOSURE AND APPARATUS THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for producing a hard mask for exposure capable of easily modifying a blank defective part without requiring a large- sized modifying equipment and capable of attaining a good exposed state without causing defects even after repeated hard contact exposure. SOLUTION: A thin film material 13 with metallic fine particles is bonded to a blank defective part 12a of a metallic layer forming a prescribed pattern 12 on a glass substrate 11. The thin film material 13 is then fired on the substrate 11 to form a metallic film 13a. Since the metallic film 13a is formed in a prescribed shape, the blank defective part 12a is easily and reliably modified in the air without requiring a vacuum environment. The resulting hard mask attains a good exposed state without causing defects even after repeated hard contact exposure.