发明名称 METHOD AND APPARATUS FOR DETECTING MARK, EXPOSURE METHOD AND ALIGNER, AND DEVICE
摘要 PROBLEM TO BE SOLVED: To easily and accurately detect a mark formed on an object. SOLUTION: An extraction unit 31 extracts a candidate pattern for a mark signal pattern from observation signals obtained from observation results, and a first arithmetic unit 32 obtains a feature quantity corresponding to the features of a mark at least by every feature thereof for the extracted candidate pattern. When a plurality of candidate patterns are extracted, a second arithmetic unit 33 obtains a converted dimensionlessly and normalized specified quantity reflecting the feature quantity difference between two candidate patterns under comparison for each feature. Based on such a specified quantity, the difference in the likelihood of 'mark signal pattern' between the candidate patterns is evaluated, and the mark signal pattern is identified, so as to detect the mark.
申请公布号 JP2001126981(A) 申请公布日期 2001.05.11
申请号 JP20000212139 申请日期 2000.07.13
申请人 NIKON CORP 发明人 NAKAJIMA SHINICHI
分类号 G01B11/00;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 G01B11/00
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